Regularized Recursive Solutions for Prediction of Aberrations Associated With…

For an improved reduction of thermally induced wavefront aberrations associated with the projection lens in deep ultraviolet lithography, this article proposes a regularization-based recursive line…

Performance-Based Active Wafer Clamp Design for Wafer Heating Effects in EUV …

To improve overlay and focus errors in lithographic applications, an active wafer clamp (AWC) concept is proposed. Using this concept, mechanical actuators deform the wafer to compensate thermally …

Control of Thermo-Mechanical Wafer Deformations in EUV Lithography Using an A…

This paper deals with the modeling and control of thermo-mechanical deformations of a wafer, resulting from absorbed exposure power, in EUV lithography. To achieve correction of the induced deforma…

Lens Heating Induced Aberration Prediction via Nonlinear Kalman Filters

Thermal Deformation Prediction in Reticles for Extreme Ultraviolet Lithograph…