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Seong, Jun Kang. (). New gate CD control technology using CF4 plasma treatment following HBr/02 Plasma treatment step in gate etch process using organic BARC . : .

Gaya Chicago

Seong, Jun Kang. New gate CD control technology using CF4 plasma treatment following HBr/02 Plasma treatment step in gate etch process using organic BARC. : , . Text.

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Seong, Jun Kang. New gate CD control technology using CF4 plasma treatment following HBr/02 Plasma treatment step in gate etch process using organic BARC. : , . Text.

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Seong, Jun Kang. New gate CD control technology using CF4 plasma treatment following HBr/02 Plasma treatment step in gate etch process using organic BARC. : , . Print.