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Bikcora, Can, Weiland, Siep, Coene, Wim M. J.. (). Thermal Deformation Prediction in Reticles for Extreme Ultraviolet Lithography Based on a Measurement-Dependent Low-Order Model . : .

Gaya Chicago

Bikcora, Can, Weiland, Siep, Coene, Wim M. J.. Thermal Deformation Prediction in Reticles for Extreme Ultraviolet Lithography Based on a Measurement-Dependent Low-Order Model. : , . Text.

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Bikcora, Can, Weiland, Siep, Coene, Wim M. J.. Thermal Deformation Prediction in Reticles for Extreme Ultraviolet Lithography Based on a Measurement-Dependent Low-Order Model. : , . Text.

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Bikcora, Can, Weiland, Siep, Coene, Wim M. J.. Thermal Deformation Prediction in Reticles for Extreme Ultraviolet Lithography Based on a Measurement-Dependent Low-Order Model. : , . Print.