Gaya APA
Kumar, Ashish, Lee, Wen Hsi, Wang, Y. L.. ().
Optimizing the Isotropic Etching Nature and Etch Profile of Si, Ge and Si0.8Ge0.2 by Controlling CF4 Atmosphere With Ar and O2 Additives in ICP .
:
.
Gaya Chicago
Kumar, Ashish, Lee, Wen Hsi, Wang, Y. L..
Optimizing the Isotropic Etching Nature and Etch Profile of Si, Ge and Si0.8Ge0.2 by Controlling CF4 Atmosphere With Ar and O2 Additives in ICP.
:
,
.
Text.
Gaya MLA
Kumar, Ashish, Lee, Wen Hsi, Wang, Y. L..
Optimizing the Isotropic Etching Nature and Etch Profile of Si, Ge and Si0.8Ge0.2 by Controlling CF4 Atmosphere With Ar and O2 Additives in ICP.
:
,
.
Text.
Gaya Turabian
Kumar, Ashish, Lee, Wen Hsi, Wang, Y. L..
Optimizing the Isotropic Etching Nature and Etch Profile of Si, Ge and Si0.8Ge0.2 by Controlling CF4 Atmosphere With Ar and O2 Additives in ICP.
:
,
.
Print.